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Nature Photo Competition | Technical Photo Competition

Alfons Bogalecki (1st place)

Polarized microphotograph of a test-chip manufactured in the 65 nm ST microelectronics CMOS process that, due to undesirable low-k inter-metal dielectrics, which acted as an optical interference filter, had to be polished down. Uneven polishing revealed the various BEOL layers and metal area filling.

Suzanne Hugo (2nd Place)

Focus on Africa

A silicon wafer with uniquely patterned micro features designed to illustrate the potential impact of microfluidics: a technology that can be channelled to help Africa grow. Feature sizes are in the range of tens to hundreds of micrometres.

Photo Resist Spinning

The photo shows the pouring of a 1um photo resist on a 3” silicon wafer just before spinning of the resist. After spinning the resist is baked and exposed via a photo lithography tool to define the various patterns during micro-electronic processing.

Bird Fossil

Residue left by a contaminated water droplet that dried on the surface of a Si wafer and was subsequently coated with positive photoresist.

SU8 trilobite

Si wafer with a layer of dioxide, coated with SU8 photoresist and exposed with a 405nm laser and developed.

Technology Channels

Passive valve microfluidic circuit, intricately designed and manufactured to create a maze of miniature fluidic and pneumatic channels as a fluid actuation device that fits into the palm of your hand.

Eye Sight

Optimal vision, achieved by a removable lens: a close up of a disposable contact lens

Microphotograph of a test-chip manufactured in the 65 nm ST microelectronics CMOS process that, due to undesirable low-k inter-metal dielectrics, which acted as an optical interference filter, had to be polished down. Uneven polishing revealed the various BEOL layers and metal area filling.

Test-chip manufactured in the AMS 0.35 µm CMOS process containing 10 light-source matrices sized for fibre-optical cable communication. While a smaller light source matrix in the top left corner is energized and produces visible light, the other matrices reflect colourfully due to their small regular patterns.

Toothpick

The photo shows the pouring of a 1um photo resist on a 3” silicon wafer just before spinning of the resist. After spinning the resist is baked and exposed via a photo lithography tool to define the various patterns during micro-electronic processing.

IR Detector

The is the cryogenic vacuum housing of a two colour short and mid infrared InSb

detector for a IR seeker also showing the electrical interface.